Wisconsin Oven, East Troy, WI, announced the shipment of two Electrically Heated Horizontal Quench Systems to the semiconductor industry. These systems are designed for the annealing and rapid cooling of various high purity alloy parts.
The operation of each horizontal quench system begins with loading the product onto a work grid located on the loading platform. After the load is lifted into position, a pusher/extractor mechanism at the front of the quench tank moves the load onto the quench lift platform. Then, the furnace pusher/extractor mechanism transfers the load into the furnace for annealing. Once the heating cycle is complete, the vertical lift door opens, and the furnace pusher/extractor moves the load back onto the quench lift platform, lowering it into the water quench tank for cooling. After adequate cooling, the quench lift raises the load, and the front-mounted pusher/extractor mechanism returns it to the scissor lift, where a blow-off system removes most of the water from the load. A video demonstrating this system’s operation is available through a provided link.
Each horizontal quench furnace can reach a maximum temperature of 1,250°F and has the capacity to heat and support a 4,500-pound gross load. These furnaces are designed to achieve a temperature uniformity of +/-10°F. The customer requested a uniformity tolerance of ±20°F at 500°F, 900°F, and 1200°F, which was documented for each system through a nine-point profile test conducted in an empty oven chamber under static conditions.
