{"id":3883,"date":"2019-01-19T17:49:13","date_gmt":"2019-01-19T17:49:13","guid":{"rendered":"https:\/\/staging.asminternational.org\/edfas\/results\/-\/journal_content\/56\/10192\/36312287\/NEWS\/"},"modified":"2023-02-07T04:52:45","modified_gmt":"2023-02-07T04:52:45","slug":"veeco-wins-innovation-award-for-its-genxcel-rd-molecular-beam-epitaxy-system","status":"publish","type":"post","link":"https:\/\/www.asminternational.org\/edfas\/results\/-\/journal_content\/56\/10192\/36312287\/NEWS\/","title":{"rendered":"Veeco wins Innovation Award for its GENxcel R&amp;D molecular beam epitaxy system"},"content":{"rendered":"<p style=\"margin-bottom:.0001pt\"><span style=\"line-height:normal\"><span style=\"font-size:12.0pt\">Veeco Instruments Inc., Plainview, N.Y., announces that its GENxcel R&amp;D Molecular Beam Epitaxy System earned the 2018 Compound Semiconductor (CS) Industry Innovation<u> <\/u>Award. Hosted by <i>Compound Semiconductor<\/i> magazine, the CS Industry Awards celebrate the success of companies across five unique categories. Specifically, the Innovation Award honors the most significant breakthrough in compound semiconductor manufacturing over the last 12 months. <\/span><\/span><\/p>\n<p style=\"margin-bottom:.0001pt\">&nbsp;<\/p>\n<p style=\"margin-bottom:.0001pt\"><span style=\"line-height:normal\"><span style=\"font-size:12.0pt\">The GENxcel R&amp;D MBE system builds on the success of the GENxplor MBE system designed for compound semiconductor R&amp;D and pilot production markets. The system produces high-quality epitaxial layers on substrates up to 100mm in diameter. The innovative architectural concept of GENxcel reduces the system footprint by 40 percent compared to similar 100mm wafer systems, improves the ease of maintenance, and allows users to easily integrate additional deposition and analysis chambers\u2014specifically Veeco\u2019s new atomic layer deposition (ALD) product line.<\/span><\/span><\/p>\n<p style=\"margin-bottom:.0001pt\">&nbsp;<\/p>\n<p style=\"margin-bottom:.0001pt\"><span style=\"line-height:normal\"><span style=\"font-size:12.0pt\"><a href=\"http:\/\/www.veeco.com\/products\/genxcel-randd-mbe-system\">http:\/\/www.veeco.com\/products\/genxcel-randd-mbe-system<\/a><\/span> <\/span><\/p>\n","protected":false},"excerpt":{"rendered":"<p>Veeco Instruments Inc., Plainview, N.Y., announces that its GENxcel R&#038;D Molecular Beam Epitaxy System earned the 2018 Compound Semiconductor (CS) Industry Innovation Award.<\/p>\n","protected":false},"author":63082,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"_acf_changed":false,"footnotes":""},"categories":[434,439,435,436,1],"tags":[],"class_list":["post-3883","post","type-post","status-publish","format-standard","hentry","category-electronics","category-materials-processing-and-treatment","category-news","category-news-articles","category-uncategorized"],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v27.9 - 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