{"id":4271,"date":"2015-08-14T00:37:23","date_gmt":"2015-08-14T00:37:23","guid":{"rendered":"https:\/\/staging.asminternational.org\/edfas\/results\/-\/journal_content\/56\/10192\/25693322\/NEWS\/"},"modified":"2023-02-07T04:53:14","modified_gmt":"2023-02-07T04:53:14","slug":"oxford-instruments-launches-silicon-drift-detector-with-ultrahigh-resolution-at-low-kv","status":"publish","type":"post","link":"https:\/\/www.asminternational.org\/edfas\/results\/-\/journal_content\/56\/10192\/25693322\/NEWS\/","title":{"rendered":"Oxford Instruments launches silicon drift detector with ultrahigh resolution at low kV"},"content":{"rendered":"

\n\tOxford Instruments, U.K., has launched X-Max Extreme, a silicon drift detector for ultrahigh resolution FEG and FIB-SEM applications. It is a windowless 100 mm2<\/sup><\/span> version of X-Max designed to maximize sensitivity and spatial resolution. It is based on a radical geometry to optimize both imaging and EDS performance in ultrahigh resolution FEG-SEMs while working at low kV and short working distance.<\/p>\n

\n\tThis unique detector for the first time enables EDS data collection at very low kV (between 1 and 3 kV) and a very short working distance to provide elemental analysis under the same conditions as those for analyzing nano-materials and surfaces at the highest SEM resolution.<\/p>\n

\n\tThe latest ultra-high resolution FEG-SEMs offer new capabilities for investigating smaller nano-structures, interfaces, and surfaces. However, under the operating conditions needed to make use of new electron signal contrasts from in-lens detectors (very short working distance, very low kV, and minimal beam current ) no traditional SDD could provide supporting elemental characterization. The new X-Max Extreme changes this. With X-Max Extreme, both imaging and EDS performance can be carried out simultaneously, and the EDS resolution approaches that of the SEM.<\/p>\n

\n\tX-Max Extreme is based on a windowless 100 mm2<\/sup><\/span> detector; its radical geometry enables data acquisition under short working distance. It therefore provides elemental analysis under the same conditions for analysis of nano-materials and surfaces at the highest SEM resolution.<\/p>\n

\n\tAccording to X-ray Business Manager, Dr. Simon Burgess, “X-Max delivers solutions beyond conventional micro- and nano-analysis.  For example, the sensitivity of the Extreme allows users to characterize the composition and distribution of surface contaminants and layers a few atoms thick. It also provides superb detection of light elements, including lithium.”<\/p>\n

\n\twww.oxford-instruments.com <\/p>\n

\n\t <\/p>\n","protected":false},"excerpt":{"rendered":"

Oxford Instruments, U.K., has launched X-Max Extreme, a silicon drift detector for ultrahigh resolution FEG and FIB-SEM applications.<\/p>\n","protected":false},"author":63082,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"_acf_changed":false,"footnotes":""},"categories":[434,450,438,435,436,1],"tags":[],"class_list":["post-4271","post","type-post","status-publish","format-standard","hentry","category-electronics","category-general","category-nanotechnology","category-news","category-news-articles","category-uncategorized"],"yoast_head":"\nOxford Instruments launches silicon drift detector with ultrahigh resolution at low kV - Electronic Device Failure Analysis Society<\/title>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.asminternational.org\/edfas\/results\/-\/journal_content\/56\/10192\/25693322\/NEWS\/\" \/>\n<meta property=\"og:locale\" content=\"en_US\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Oxford Instruments launches silicon drift detector with ultrahigh resolution at low kV - 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