{"id":4400,"date":"2014-10-20T04:53:41","date_gmt":"2014-10-20T04:53:41","guid":{"rendered":"https:\/\/staging.asminternational.org\/edfas\/results\/-\/journal_content\/56\/10192\/22568873\/NEWS\/"},"modified":"2023-02-07T04:53:23","modified_gmt":"2023-02-07T04:53:23","slug":"tescan-introduces-fib-sem-workstation-with-1-5-nm-resolution-integrated-raman-system","status":"publish","type":"post","link":"https:\/\/www.asminternational.org\/edfas\/results\/-\/journal_content\/56\/10192\/22568873\/NEWS\/","title":{"rendered":"Tescan introduces FIB-SEM workstation with 1.5 nm resolution, integrated Raman system"},"content":{"rendered":"<p>\n\tTescan, Warrendale, Pa., introduces the new GAIA3 FIB-SEM workstation, which builds on the success of the Tescan Lyra FIB-SEM workstation. The GAIA3 features a newly developed ultra-high resolution SEM column and integrated Raman system. The GAIA3 addresses all FIB-SEM application requirements in nanotechnology and semiconductors.<\/p>\n<p>\n\tThe proven third-generation design ensures the highest reliability and uptime with uncompromised ease of use for TEM sample preparation, advanced e-beam and ion lithography, and all forms of 3D characterization, including cryo integration. The workstation concept holds true for all multi-user environments, as the GAIA3 will enable novice and advanced users alike to achieve optimum results.<\/p>\n<p>\n\tThe GAIA3 newly designed electron column will provide &lt;1.5 nm resolution at @ 1 keV and &lt; 3 nm @ 30 keV ion column performance.<\/p>\n<p>\n\tTscan will deliver the first GAIA3 FIB-SEM workstation in October of 2014.<\/p>\n<p>\n\tTescan Orsay Holding is a leading provider of scientific instrumentation and is well known for its innovation and openness to work with researchers, customizing applications to fit specific needs. Established in 1991, Tescan is an ISO certified company with a long tradition of excellence.<\/p>\n<p>\n\t<a href=\"http:\/\/www.tescan-usa.com\/\">www.tescan-usa.com<\/a><\/p>\n<p>\n\t&nbsp;<\/p>\n","protected":false},"excerpt":{"rendered":"<p>Tescan, Warrendale, Pa., introduces the new GAIA3 FIB-SEM workstation, which builds on the success of the Tescan Lyra FIB-SEM workstation.<\/p>\n","protected":false},"author":63082,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"_acf_changed":false,"footnotes":""},"categories":[434,450,438,435,436,1],"tags":[],"class_list":["post-4400","post","type-post","status-publish","format-standard","hentry","category-electronics","category-general","category-nanotechnology","category-news","category-news-articles","category-uncategorized"],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v27.9 - https:\/\/yoast.com\/product\/yoast-seo-wordpress\/ -->\n<title>Tescan introduces FIB-SEM workstation with 1.5 nm resolution, integrated Raman system - Electronic Device Failure Analysis Society<\/title>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.asminternational.org\/edfas\/results\/-\/journal_content\/56\/10192\/22568873\/NEWS\/\" \/>\n<meta property=\"og:locale\" content=\"en_US\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Tescan introduces FIB-SEM workstation with 1.5 nm resolution, integrated Raman system - Electronic Device Failure Analysis Society\" \/>\n<meta property=\"og:description\" content=\"Tescan, Warrendale, Pa., introduces the new GAIA3 FIB-SEM workstation, which builds on the success of the Tescan Lyra FIB-SEM workstation.\" \/>\n<meta property=\"og:url\" content=\"https:\/\/www.asminternational.org\/edfas\/results\/-\/journal_content\/56\/10192\/22568873\/NEWS\/\" \/>\n<meta property=\"og:site_name\" content=\"Electronic Device Failure Analysis Society\" \/>\n<meta property=\"article:published_time\" content=\"2014-10-20T04:53:41+00:00\" \/>\n<meta property=\"article:modified_time\" content=\"2023-02-07T04:53:23+00:00\" \/>\n<meta name=\"twitter:card\" content=\"summary_large_image\" \/>\n<meta name=\"twitter:label1\" content=\"Written by\" \/>\n\t<meta name=\"twitter:data1\" content=\"\" \/>\n\t<meta name=\"twitter:label2\" content=\"Est. reading time\" \/>\n\t<meta name=\"twitter:data2\" content=\"1 minute\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\\\/\\\/schema.org\",\"@graph\":[{\"@type\":\"Article\",\"@id\":\"https:\\\/\\\/www.asminternational.org\\\/edfas\\\/results\\\/-\\\/journal_content\\\/56\\\/10192\\\/22568873\\\/NEWS\\\/#article\",\"isPartOf\":{\"@id\":\"https:\\\/\\\/www.asminternational.org\\\/edfas\\\/results\\\/-\\\/journal_content\\\/56\\\/10192\\\/22568873\\\/NEWS\\\/\"},\"author\":{\"name\":\"\",\"@id\":\"\"},\"headline\":\"Tescan introduces FIB-SEM workstation with 1.5 nm resolution, integrated Raman system\",\"datePublished\":\"2014-10-20T04:53:41+00:00\",\"dateModified\":\"2023-02-07T04:53:23+00:00\",\"mainEntityOfPage\":{\"@id\":\"https:\\\/\\\/www.asminternational.org\\\/edfas\\\/results\\\/-\\\/journal_content\\\/56\\\/10192\\\/22568873\\\/NEWS\\\/\"},\"wordCount\":189,\"publisher\":{\"@id\":\"https:\\\/\\\/www.asminternational.org\\\/edfas\\\/#organization\"},\"articleSection\":[\"Electronics\",\"general\",\"Nanotechnology\",\"news\",\"News Articles\"],\"inLanguage\":\"en-US\"},{\"@type\":\"WebPage\",\"@id\":\"https:\\\/\\\/www.asminternational.org\\\/edfas\\\/results\\\/-\\\/journal_content\\\/56\\\/10192\\\/22568873\\\/NEWS\\\/\",\"url\":\"https:\\\/\\\/www.asminternational.org\\\/edfas\\\/results\\\/-\\\/journal_content\\\/56\\\/10192\\\/22568873\\\/NEWS\\\/\",\"name\":\"Tescan introduces FIB-SEM workstation with 1.5 nm resolution, integrated Raman system - 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