{"id":4442,"date":"2014-07-18T15:01:09","date_gmt":"2014-07-18T15:01:09","guid":{"rendered":"https:\/\/staging.asminternational.org\/edfas\/results\/-\/journal_content\/56\/10192\/20180490\/NEWS\/"},"modified":"2023-02-07T04:53:26","modified_gmt":"2023-02-07T04:53:26","slug":"nikon-wins-best-of-west-award-for-its-immersion-scanner","status":"publish","type":"post","link":"https:\/\/www.asminternational.org\/edfas\/results\/-\/journal_content\/56\/10192\/20180490\/NEWS\/","title":{"rendered":"Nikon wins \u201cBest of West\u201d award for its Immersion Scanner"},"content":{"rendered":"<p>\n\tNikon Precision, Belmont, Calif., has won the 2014 &#8220;Best of West&#8221; Award for its NSR-S630D Immersion Scanner. It incorporates newly designed optics that deliver multiple levels of active control, while the semiconductor industry is moving to development and high volume manufacturing of sub-10nm generation process devices. It leverages established immersion technology, while incorporating key innovations to deliver mix-and-match overlay (MMO) capabilities below 2.5 nm.<\/p>\n<p>\n\tThe NSR-S630D incorporates newly designed optics that deliver multiple levels of active control, while The semiconductor industry is moving to development and high volume manufacturing of sub-10nm generation process devices. Budgets are even tighter at these advanced nodes, making enhanced stability vital. The NSR-S630D leverages established immersion technology, while incorporating key innovations to deliver mix-and-match overlay (MMO) capabilities below 2.5 nm and throughput greater than 250 wafers per hour, in addition to critical overlay and focus with &#8220;sustained stability.&#8221;<\/p>\n<p>\n\tThe NSR-S630D leverages builds upon the Streamlign platform, incorporating further developments in stage, optics, and autofocus technology to deliver unprecedented performance with &#8220;sustained stability&#8221; to enable the 10\/7nm node. Additionally, the S630D provides world-class throughput ? 250 WPH, and is compatible with advanced software solutions that ensure peak manufacturing performance. Significant technical, infrastructure, and business-related issues continue for EUVL, with unclear cost benefits. A 300mm process step and cost comparison for EUVL double patterning (DP) was 2x higher than ArF immersion multiple patterning, and EUV DP results were even less favorable under 450 mm conditions. From the overall cost perspective, new technologies are not always the best approach, and based on 10 years of success, it is believed that 193i immersion will remain the low cost solution moving forward.<\/p>\n<p>\n\tThe award recognizes important product and technology developments in the microelectronics supply chain. The Best of West finalists were selected based on their financial impact on the industry, engineering or scientific achievement, and\/or societal impact.<\/p>\n<p>\n\t<a href=\"http:\/\/www.nikonprecision.com\/\" target=\"_blank\" rel=\"noopener\">http:\/\/www.nikonprecision.com<\/a><\/p>\n<p>\n\t&nbsp;<\/p>\n","protected":false},"excerpt":{"rendered":"<p>Nikon Precision, Belmont, Calif., has won the 2014 &#8220;Best of West&#8221; Award for its NSR-S630D Immersion Scanner.<\/p>\n","protected":false},"author":63082,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"_acf_changed":false,"footnotes":""},"categories":[434,450,435,436,1],"tags":[],"class_list":["post-4442","post","type-post","status-publish","format-standard","hentry","category-electronics","category-general","category-news","category-news-articles","category-uncategorized"],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v27.9 - 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