{"id":6291,"date":"2022-12-08T23:24:54","date_gmt":"2022-12-08T23:24:54","guid":{"rendered":"https:\/\/staging.asminternational.org\/edfas\/advantest-unveils-e5620-dr-sem-for-review-and-classification-of-ultra-small-photomask-defects\/"},"modified":"2023-02-23T21:31:07","modified_gmt":"2023-02-23T21:31:07","slug":"advantest-unveils-e5620-dr-sem-for-review-and-classification-of-ultra-small-photomask-defects","status":"publish","type":"post","link":"https:\/\/www.asminternational.org\/edfas\/results\/-\/journal_content\/56\/10192\/50817168\/NEWS\/","title":{"rendered":"Advantest unveils E5620 DR-SEM for review and classification of ultra-small photomask defects"},"content":{"rendered":"

Advantest Corp., Japan, unveiled the E5620 Defect Review Scanning Electron Microscope (DR-SEM), its newest mask SEM product for reviewing and classifying ultra-small defects on photomasks and mask blanks. With its high-accuracy, high-throughput defect review capability, the E5620 DR-SEM is expected to contribute appreciably to production quality improvements in next-generation photomasks and shorter mask manufacturing turnaround times.<\/p>\n

Like its predecessor, the E5620 implements Advantest’s highly stable image capture technology to easily import defect location data from mask inspection systems and automatically image the locations. The system has a number of improvements specifically to target future mask requirements.<\/p>\n

\u201cIn working with our customers to determine their requirements for the future EUV photomask inspection and analysis, we identified several essential advancements to integrate into our proven DR-SEM system,\u201d said Toshimichi Iwai, senior VP of the Nanotechnology Business Group with Advantest. \u201cWith the E5620, our team of lithography experts has created a superior tool that can handle today\u2019s photomasks and is truly future-ready for the coming EUV generation.\u201d<\/p>\n

E5620 Key New Features<\/p>\n