One Minute Mentor: Plasma-Immersion Ion Implantation

The fundamental difference between plasma nitriding (glow discharge) and plasma-immersion ion implantation (PIII) is that the latter relies on high-energy pulses (up to 45 kV) that promote a low-energy ion implantation in the target, but that is still less than the energy used in conventional ion implantation (>100 kV). A combination of target temperature and pulse voltage achieve the desired implantation profile.

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