Veeco Instruments Inc., Plainview, N.Y., introduces the GENxplor Molecular Beam Epitaxy (MBE) deposition system, the industry’s first fully-integrated MBE system for the compound semiconductor R&D market. It builds epitaxial layers on substrates up to 3 in. diameter and is ideal for cutting edge research on a wide variety of materials including GaAs, nitrides, and oxides.
“The compound semiconductor R&D community asked for a more affordable, flexible, and easy-to-use MBE system and Veeco has delivered with the GENxplor,” comments Jim Northup, Veeco’s Vice President and General Manager. It is an all-in-one design that combines the reactor and electronics on a single frame.
The GENxplor uses Veeco’s proven GEN10 growth chamber design and features unmatched process flexibility, ideal for materials research on emerging technologies such as UV LEDs, high-efficiency solar cells, and high-temperature superconductors. Its efficient single frame design combines all vacuum hardware with on-board electronics to make it up to 40% smaller than other MBE systems, saving valuable lab space.
Because the manual system is integrated on a single frame, installation time is reduced. The open architecture design also improves ease of use, provides convenient access to effusion cells, and allows easier serviceability when compared to other MBE systems.
