FEI Corp., Hillsboro, Oregon, has developed the Helios NanoLab 600i, which offers advances in the ion beam, electron beam, patterning, and a range of other for advanced nanoscale materials research. It blends speed and precision to enable ultra-high resolution imaging, analysis, and fabrication at the nanoscale. Its outstanding imaging performance produces sharp, clear sub-nm resolution images for accurately resolving nanoscale features as required for materials characterization or process monitoring-even on beam sensitive or non-conductive samples.
It offers the ability to efficiently create ultra-thin, highest quality samples for HR S/TEM, thanks to a combination of FEI’s proven, highest performance ion optics and simple, reliable and precise in situ lift out. In the field of nanofabrication, the Helios NanoLab 600i is able to create the most varied and accurate prototype devices, faster than any other technique. Supporting a wide selection of integrated solutions, the Helios NanoLab 600i brings high reliability and applications flexibility to further explore and fabricate in 3D at the nanoscale to any laboratory environment.
