FEI Co., Hillsboro, Ore., has released the third generation of its Helios NanoLab DualBeam FIB/SEM microscope, which provides excellent image contrast and resolution, while at the same time adding a an easy-to-use user interface. The new Helios comes in two different workflow-specific configurations for materials science research. The CX configuration includes more versatile sample handling and positioning for fast, flexible analysis, sample preparation, and characterization.
The UC configuration provides increased sensitivity to surface detail and improved performance on soft, nonconductive, or beam-sensitive materials.
“This third generation of the Helios family continues to provide the high resolution and strong image contrast that the family is known for, but adds a new interface that can actually guide the user through typical operations,” said Trisha Rice, vice president and general manager of Materials Science for FEI. “We have optimized each of the configurations for a particular class of workflows, based on customer feedback and our long and deep involvement in DualBeam analysis.”
