Veeco Instruments Inc., Plainview, N.Y., introduces the Propel Power Gallium Nitride (GaN) Metal Organic Chemical Vapor Deposition (MOCVD) system, which incorporates single-wafer reactor technology for outstanding film uniformity, yield, and device performance.
Nikon Instruments Inc., Melville, N.Y., and JEOL, Peabody, Mass., have formed a partnership to research and develop solutions to address correlative light and electron microscopy.
Craic Technologies, San Dimas, Calif., announces Spectral Surface Mapping (S2M) software for its UV-visible-NIR microspectrophotometers.
Electro Scientific Industries Inc., Portland, Maine, announces the µFlex Series multi-axis precision laser micromachining platform.
Applied Materials Inc., Santa Clara, Calif., announces that it has collaborated with Samsung Electronics Co. and PSK Inc., a Korea-based leader in photoresist removal, to develop an advanced patterning solution for the manufacture of future generations of NAND and DRAM device designs.
