Outokumpu Oy, Finland, announces that the stainless steel fuel tank developed by its engineers and TechROi Fuel Systems received the New Applications Award presented by the International Stainless Steel Forum in the “Best New Development” category at the ISSF Annual Conference in Hong Kong.
Olympus Scientific Solutions Americas Inc., Waltham, Mass., introduces the Epoch 650 digital ultrasonic flaw detector that combines conventional ultrasonic flaw detection capabilities with the efficiency of a highly portable, intuitive instrument.
FEI Co., Hillsboro, Ore., offers the Helios NanoLab 460F1, which combines the highest resolution scanning electron microscope (Elstar+UC SEM) and focused ion beam (Tomahawk FIB) columns on the market today with the most advanced sample manipulation capabilities.
Jeol USA, Peabody, Mass., announces that a state-of-the-art Jeol e-beam lithography system will soon be installed at the University of Waterloo Quantum NanoFab in Waterloo, Ontario.
Park Systems, Santa Clara, Calif., introduces the NX-Hivac AFM system for semiconductor failure analysis.
