Semiconductor test equipment supplier Advantest Corporation, Japan, announced the T5801 Ultra-High-Speed DRAM Test System to support the latest advancements in high-speed memory technologies —including GDDR7, LPDDR6, and DDR6— critical to meeting the growing demands of artificial intelligence, high-performance computing, and edge applications.
First full wafer-scale fabrication of electrically-pumped GaAs-based nano-ridge lasers on 300 mm silicon wafers
Imec, Belgium, a world-leading research and innovation hub in nanoelectronics and digital technologies, has announced a significant milestone in silicon photonics with the successful demonstration of electrically-driven GaAs-based multi-quantum-well nano-ridge laser diodes fully, monolithically fabricated on 300 mm silicon wafers in its CMOS pilot prototyping line.
Nikon’s NEXIV VMF-K Series enhances measurement speed for precision inspection
Advanced Materials & Processes, Volume 183, Issue 2, March 2025 (ASM International)
Ski wax secrets: What makes you glide faster?
In this video, dive into the materials science of ski waxes, exploring the transition from PFAS-based formulations to innovative bio-based and nonfluorinated alternatives, their environmental impact, and the cutting-edge chemistry behind glide performance, hydrophobicity, and the importance of surface morphology.





