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Scanning Electron Microscopy

Author: W. Vanderlinde, IARPA   |   Document Download   |   Product code: ZMEFA2011P477

File size: 2 MB

Price: $25.00 Member Price: $20.00
The scanning electron microscope (SEM) remains the most versatile instrument in the failure analysis lab for high resolution imaging. Other tools such as TEM or AFM may have higher ultimate resolution, but the SEM is more generally useful because of simple sample preparation, high depth of field, and ease of navigation. For comparison, TEM requires thinning a sample to a 100 nm or less and then only a very small area of the sample can be imaged. AFM requires a sharp tip to be scanned across a sample surface, thus only a very small area can be imaged and the apparent shape of the sample surface can be distorted by tip convolution effects. The SEM requires little or no sample preparation and large samples can be scanned. Under the right circumstances SEM can achieve 1 nm resolution which is very close to TEM and AFM. It is also relatively simple and inexpensive to add an energy dispersive x-ray detector (EDX) to a SEM which then provides a very useful chemical micro-analysis capability.
  • From: Microelectronics Failure Analysis, Desk Reference Sixth Edition
  • Published: October 01, 2011
  • Pages: 20
  • Review Type: Peer reviewed