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Nanotronics patented Super Resolution imaging system identifies defects in less time
May 17, 2019
Source: ASM International
Nanotronics, Brooklyn, N.Y., has expanded its Super Resolution imaging system portfolio with a new patented system that identifies and classifies defects at lower resolutions than traditional inspection microscopy, providing faster scan times and enhanced throughput.
The use of lower magnifications to identify defects that are traditionally only visible at higher magnifications or with specialized microscopes (e.g., Atomic Force Microscopy, Electron Microscopy) simplifies the data-acquisition process and produces images that are less susceptible to noise and focus-related artifacts. The resulting whole-sample images produce greater detection confidence, better yields, and lower time to market.
“Tomorrow’s manufacturing processes require solutions that push beyond the limits of traditional microscopy,” says Matthew Putman, Nanotronics CEO and Cofounder. “Nanotronics is building a patent estate that combines Super-Resolution inspection, robotics, and AI to give our company further inroads into sectors such as quantum, next-generation electronics, and genomics. The market for these sectors will continue to expand.”
A single inspection system can have more than one objective, each with a different resolving power. Higher resolution objectives capture more detail but have decreased throughput due to smaller fields of view. By combining lower resolution images with the aid of artificial intelligence models, inspection platforms can synthesize higher resolution images without sacrificing speed or accuracy.
Industries and Applications | Electronics
Industries and Applications | Nanotechnology