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Practically Brand New at 50!

  • September 26 - September 27, 2017
  • Kay Boardrooms (Rooms 1107 and 1111) in the Jeong H. Kim Engineering Building, University of Maryland, College Park
  • College Park , Maryland , US


Join us for a look back as well as forward at a core technology for materials science!

2018 will mark the 50th anniversary of semiconductor-based energy dispersive X-ray spectrometry (EDS) on an electron probe microanalyzer (EPMA) (Fitzgerald, Keil, and Heinrich, Science, v159 (1968) 528).  EDS was quickly combined with the scanning electron microscope (SEM) to make X-ray microanalysis a widely available elemental characterization method with applications in the physical and biological sciences, technology, failure analysis, and forensic science. 

Within its first decade, SEM/EDS demonstrated the capability of rigorous quantitative microanalysis matching EPMA/WDS in the absence of peak interference. The emergence of the silicon drift detector (SDD) implementation of EDS (Struder et al., Mikrochim. Acta, v15 (1998) 11) has provided much higher throughput (by a factor of 50 or more at the same resolution) combined with extraordinary peak stability in both shape and calibration, which is ideal for accurate peak fitting.  This SDD-EDS performance enables collection of high count spectra (10 million counts or more within 100 s) that provide the basis for accurate, precise and sensitive quantitative analysis, despite severe peak interference and large differences in concentration.  Even with severe interference from a major constituent (C > 0.1 mass fraction), trace constituents can be measured to C = 0.0005 (500 ppm) or less. Iterative qualitative analysis (i.e., peak identification) and standards-based quantitative analysis with careful inspection of the peak-fitting residual spectrum after each stage can reveal unexpected constituents hidden under high concentrations of interfering elements. 

Trace analysis, low atomic number elements, low beam energy microanalysis, SEM/ EDS can do it all, effectively replacing EPMA/WDS for elemental microanalysis down to 500 ppm, and at much lower electron dose.

Dr. Dale Newbury is in the Materials Measurement Science Division at the National Institute of Standards and Technology (NIST). He began his career at NIST in 1972 and led the Microanalysis Research Group in the Surface and Microanalysis Science Division before becoming a NIST fellow in 1994. Dale holds a PhD in Metallurgy and Materials Science from Oxford University and a B.S. in Metallurgy and Materials Science from Lehigh. He has received many notable awards, including the Bronze, Silver, and Gold Awards from the U.S. Department of Commerce and the Duncumb Award for Excellence in Microscopy from the Microbeam Analysis Society. Dale is also a fellow of the Microscopy Society of America, has one patent, more than 390 publications to date, and is co-author of six books including Scanning Electron Microscopy and X-ray Microanalysis.

Location: Kay Boardrooms (Rooms 1107 and 1111) in the Jeong H. Kim Engineering Building
Intersection of Paint Branch Drive and Stadium Drive at the University of Maryland

Parking: Closest free lot is 11B, after 4 pm.  See map.
Metro: Information for connecting via the free UMD Shuttle from the College Park metro can be found here.

6:00 pm - Chapter Volunteers Meeting
6:30 pm - Social and networking
7:15 pm - Dinner
8:00 pm - Presentation

$20 members, $10 for full-time students. RSVP to byWednesday, September 20.

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