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Ultra-short laser deposition for thinner precious metal thin films

Picodeon Ltd., li, Finland, developed ColdAb ultra-short pulsed laser deposition technology (US PLD) for use in the application of gold and platinum thin films, enabling thinner films and thereby reducing precious metal costs.

Precious metals like gold and platinum are finding more and more industrial applications in memory storage, energy harvesting, energy storage, and microelectromechanical systems (MEMS) applications. Traditional production methods for thin gold films include sputtering, evaporation, and chemical vapor deposition, all of which have limitations either in quality, production efficiency, or industrial scalability.

The Coldab US PLD process produces thin films, down to nanoscale, with excellent quality at production rates exceeding, for example, sputtering technology. “Due to the high standard of film quality produced by Picodeon Coldab process, film thickness can be reduced by as much as 40-50%, cutting actual production costs,” said Picodeon CEO Dr. Jari Liimatainen. “Furthermore, the material yield from target to coating is excellent, typically 85-90%, giving additional cost savings in precious materials.”

US PLD deposition is a cold ablation technology which works across a vast range of coating materials and substrates. By adjusting processing parameters, coating structure and properties can be tailored to the requirements of the application, even for nanostructure-scale surface coatings.  The technology delivers very high coating integrity without pinholes, giving improved thin film reliability.

“Picodeon recently delivered a development project related to sensors. We used ColdAb Series2 R&D equipment to coat thin, less than 100 nm films, on silicon. Adhesion was achieved without any adhesive layers, and analytics showed a higher RAMAN intensity compared to standard Au coatings. This was exactly what we were looking for,” said VP of sales, Marko Mylläri. 

In addition to precious metal, Picodeon’s Coldab process enables the deposition of high hardness compounds such as diamond-like carbon compounds, carbon nitrides, and carbon nitride composites containing polytetrafluoroethylene (PTFE), boron nitride (BN) or boron carbide (BC) as well as a wide range of other borides, oxides and precious metal thin films. 

The high production rates and excellent coating qualities of the US PLD technology open new possibilities and applications for pulsed laser deposition coatings. In selected areas it may even enable the development of exclusive coating methods.

Image caption – ColdAb deposition process showing plasma plume.

More information: Picodeon Ltd.

 

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