Jeol USA, Peabody, Mass., announces that a state-of-the-art Jeol e-beam lithography system will soon be installed at the University of Waterloo Quantum NanoFab in Waterloo, Ontario. The JBX-6300FS e-beam system will be used to write circuitry patterns at very high resolution and linewidths as small as 8 nm. With accelerating voltage capability to 100kV, high-resolution patterns can be written on substrates coated in thick resist.
“We’re very excited to obtain this 100kV system,” said Vito Logiudice, Director of Operations for the Quantum NanoFab. “This opens the lab up for certain types of research where people need to use thick resist, all while pushing the limits on minimum feature size.” The new system will be an integral part of the Quantum Nanofab’s goal of providing the tools needed for next-generation quantum devices.
The challenge of creating ever more powerful microchips that continue to shrink in size, demands new technologies on the scale of individual atoms. Through the work being done in the Quantum Nanofab, which serves the Institute for Quantum Computing (IQC) and the Waterloo Institute for Nanotechnology (WIN), the University of Waterloo is poised to make that leap. Researchers will be able to “corral” single electrons through the lithography patterns they will write using the JEOL JBX-6300FS.
An attractive aspect of the JBX 6300FS is the wide spectrum of user experience the system can now accommodate. The University of Waterloo is teaming up with JEOL and Cornell University’s Nanofabrication Facility to showcase the system’s dual interfaces, both a traditional GUI/Graphical User Interface and a powerful Python-based scripting language. With scripting, power users can manipulate incoming data and perform exposures based on non-periodic arrays or logarithmic dose arrays, for example. However, that same scripting power allows the creation of new GUI’s based on the comfort or training level of the user.
