FEI Co., Hhillsboro, Ore., offers the Helios NanoLab 460F1, which combines the highest resolution scanning electron microscope (Elstar+UC SEM) and focused ion beam (Tomahawk FIB) columns on the market today with the most advanced sample manipulation capabilities. In-situ, low kV (30kV) STEM imaging reduces the time to high-resolution, high-contrast imaging. New, high-precision deposition and etching capabilities are mated with enhanced sample control and an extensive automation suite.
It contains the EasyLift Nanomanipulator to support higher yields for TEM sample lift-out through an intuitive, integrated UI. It also features the MultiChem Gas Delivery System for optimized beam-assisted deposition or etching. Both systems were designed and built based on years of application knowledge and expertise in the fields of in situ sample lift-out and gas-assisted FIB/SEM applications. In addition to simplifying the process for advanced failure analysis and TEM sample preparation, EasyLift and MultiChem improve operator confidence and consistency, reducing the Cost of Ownership as it relates to consumables usage.
With the Helios 460F1 system, pathfinding labs are able to shorten the “time to usable data” by producing a high- contrast, high-resolution STEM image, thus reducing the demand for standalone S/TEM systems. Every hour or day spent waiting for new process or material qualifications data from the lab can result in delays in getting new products to market. The ability to quickly produce high-quality, actionable 30kV STEM images within the DualBeam provides a clear advantage to your lab.
