The Semiconductor Manufacturing Technology division of Zeiss, Germany, offers MeRiT HR II, a photomask repair tool with a significantly higher degree of automation and increased flexibility in the repair of transparent and opaque defects. After a short setup routine, the tool is able to seamlessly repair numerous defects without the need for human interaction. In case of any doubt, a security interlock consults the operator, who can intervene when necessary.
The redesigned tool includes a sound automation package that enables a new level of automation with optimized repair flow. A higher throughput due to less idling time is also offered.Any defect geometry on all known as well as new mask types and materials can be processed: Binary, OMOG, HD MoSi, and EUV. The technical specifications of the MeRiT HR II match the industry roadmap and sharpness market requirements.
“The significantly improved automation level of the new MeRiT HR II frees up precious operator time. Furthermore, the combination of automation and manual repair provides an increased flexibility. Altogether the new system includes the most relevant requirements mask shops have for repairing all kinds of photomask types in a very short time,” says Dr. Oliver Kienzle, head of Semiconductor Metrology Systems.
