Ultra Tec, Santa Ana, Calif., reports that its Arc-lite antireflective (AR) coating system coats package, board, and wafer level devices very rapidly, generally in less than one minute. These reliable room-temperature backside AR coatings are NIR optimized and require no subsequent baking.
The system improves images at all observation wavelengths, from 950 to 1400 nm and beyond. This makes coatings effective for all backside microscopy techniques, including photon emission microscopy, laser-scan, thermal and voltage alteration scans, SIFT, and FIB.
Arc-lite reaches maximum functionality when used in combination with an ASAP-1 Selected Area Prep system or UltraPol Advanced Flat Lapping machine. Both of these produce optimized, backside-thinned and polished samples, ready for AR coating.
