Coventor Inc., Cary, N.C., announces the availability of SEMulator3D 6.1, the latest version of its semiconductor virtual fabrication platform.This new version further increases the accuracy of the process simulation, geometry, and modeling of advanced semiconductor processes with new features and usability enhancements. Along with SEMulator3D Version 6.1, Coventor is releasing an all-new SEMulator3D Analytics add-on component that automates statistical analysis of process variation directly from within the SEMulator3D process-predictive platform.
In semiconductor device fabrication, the various processing steps have grown increasingly complex as smaller semiconductor feature sizes and nodes are developed. With shrinking process technologies, variability in unit process behavior can have a significant impact on device structure, device performance, defect modes, and ultimate yield. SEMulator3D Analytics automates statistical analysis of process variation so that users can better understand the potential impact of statistical process variation on device performance and yield. The new Analytics user interface guides users in the design, execution, and analysis of large statistical experiments by various techniques, including Monte-Carlo process analysis.
“The real breakthrough here is our ability to drive technology yield ramp actions by optimizing process steps and process variation in a statistical environment. Important process parameters can be statistically analyzed to identify areas of concern with structural measurements, yield checks, and electrical specifications,” says David Fried, CTO of Coventor. “Now, our users can automate the large statistical design of experiments for virtual fabrication, to minimize critical defects and maximize device performance and yield.”
