Fujifilm Corp., Tokyo, and imec, Leuven, Belgium, developed a new photoresist technology for organic semiconductors that enables the realization of submicron patterns. Due to their lightness, flexibility, and ability to be manufactured in large area, research and development on organic semiconductors has intensified in recent years.
Leica Microsystems, Buffalo Grove, Ill., launches a high-precision scanning stage for stereo microscopes and macroscopes, the Leica LMT260 XY Scanning Stage. To ensure successful experiments, it offers a repeatability of 0.25 µm for samples weighing less than 0.5 kg, and of 1 µm for heavier loads of 1.5 kg. This repeatability is reached at a resolution of 5 nm. Such precision is especially interesting for users who perform time-lapse experiments such as mark and find, or multi-well screenings.
State University of New York, Albany, N.Y., announces that the pioneering College of Nanoscale Science and Engineering will become a separate institution within the SUNY system by the 2014-15 academic year. The establishment of SUNY CNSE will further cement New York’s position as a global center for nanotechnology innovation, high tech industry and research, and unmatched educational opportunities.
Connecticut Center for Advanced Technology Inc. (CCAT), East Hartford, Conn., announced that its Advanced Manufacturing Center (AMC) was named a Center of Excellence for additive manufacturing services by Optomec Inc., a leading manufacturer of laser based 3D printers for metals.
Anasys Instruments, Santa Barbara, Calif., announces the nanoIR2, a second generation AFM based IR spectroscopy (AFM-IR) platform. A key breakthrough is the ability of the nanoIR2 to operate with top-side illumination, eliminating the prior need to prepare samples on a ZnSe prism and enabling measurements on a much more diverse set of samples.
