Analytik Jena AG, Germany, introduces the PlasmaQuant PQ 9000, its first High-Resolution Array ICP OES (optical emission spectrometry using inductively coupled plasma) for multiple element analysis.
Researchers at the Fraunhofer Institute for Nondestructive Testing IZFP, Germany, have developed an ultrasonic phased-array instrument that enables them to produce high-resolution 3D images.
Carl Zeiss Microscopy, Peabody, Mass., introduces the first system of the new Crossbeam 340 and 540 series FIB-SEMs for nanotomography and nanofabrication.
SUSS MicroTec, Germany, has launched the DSC300 Gen2 projection scanner, a platform for wafer sizes up to 300 mm based on the projection lithography technology developed by SUSS MicroTec Photonic Systems Inc. (formerly Tamarack Scientific).
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