Cadence Design Systems Inc., San Jose, Calif., announces that its implementation and signoff tools have achieved certification on the Intel third-generation 10 nm tri-gate process for customers of Intel Custom Foundry.

Hitachi High-Tech, Schaumburg, Ill., has developed the 9000 Conductor Etch Series to support next-generation devices at 20 nm and below that require double-patterning, 3D structures, and complex, high-precision processes.

Mentor Graphics Corp., Wilsonville, Ore., has announced a collaboration with ARM to provide accessible and affordable access to Mentor’s Tanner AMS analog/mixed-signal design flow for ARM Cortex-M0 processor-based implementations as part of the ARM DesignStart program.