Jeol USA, Peabody, Mass., introduces the 7000 series of Field Emission Scanning Electron Microscopes with ultrahigh resolution and low-kV/low-vacuum operation for imaging and nano-analysis of structures, surface details, and magnetic samples.
Cadence Design Systems Inc., San Jose, Calif., and Applied Materials Inc., Santa Clara, Calif., are collaborating on a development program to optimize the chemical-mechanical planarization (CMP) process through silicon characterization and modeling for advanced-node designs at 14 nm and below.
National Instruments, Austin, Texas, introduces its Semiconductor Test Systems (STS), which feature PXI modular instrumentation and open system design software for semiconductor test environments.