Applied Materials Inc., has developed its Applied Endura Volta CVD Cobalt system, the only tool capable of encapsulating copper interconnects in logic chips beyond the 28nm node by depositing precise, thin cobalt films.
Georgia Tech PRC and Finetech demonstrate copper Interconnects without solder
Sematech achieves zero defects per mask at 100 nm sensitivity in deposited EUV multilayers
Sematech, Albany, N.Y., announces that its researchers have reached a significant milestone in reducing to zero the defects generated by tools from the multi-layer deposition of mask blanks for extreme ultraviolet lithography.





