This new profile series introduces leading materials scientists from around the world who happen to be females. Here we speak with Ida Berglund, materials design engineer for QuesTek Innovations LLC.
How a Scanning Tunneling Microscope Works
One Minute Mentor: Plasma-Immersion Ion Implantation
The fundamental difference between plasma nitriding (glow discharge) and plasma-immersion ion implantation (PIII) is that the latter relies on high-energy pulses (up to 45 kV) that promote a low-energy ion implantation in the target, but that is still less than the energy used in conventional ion implantation (>100 kV). A combination of target temperature and pulse voltage achieve the desired implantation profile.





