Veeco Instruments Inc., Plainview, N.Y., has launched the TurboDisc K475i arsenic phosphide (As/P) metal organic chemical vapor deposition (MOCVD) system for the production of red, orange, and yellow light-emitting diodes, as well as multi-junction III-V solar cells, laser diodes, and transistors. Incorporating proprietary TurboDisc and Uniform FlowFlange MOCVD technologies, the system enables Veeco customers to reduce LED cost per wafer by up to 20% compared to alternative systems, through higher productivity, best-in-class yields, and reduced operating expenses.
The K475i system features a new reactor design incorporating Veeco’s Uniform FlowFlange technology, which produces films with very high uniformity and improved within-wafer and wafer-to-wafer repeatability, with the industry’s lowest particle generation. The simple design of the Uniform FlowFlange technology provides ease-of-tuning for fast process optimization and fast tool recovery time after maintenance, for the highest productivity for applications such as lighting, solar, laser diodes, pseudomorphic high electron mobility transistors (pHEMTs) and heterojunction bipolar transistors (HBTs).
“Veeco continues to drive innovation with MOCVD technology that enables us to lower manufacturing costs and increase production with systems that are reliable, flexible and easy to use,” said Shuangxiang Zhang, General Manager of Yangzhou Changelight Co., Ltd.
According to research firm Strategies Unlimited, R/O/Y LED demand is expected to grow at a 10% compound annual rate through 2023. This demand for red, orange, and yellow LEDs is being driven by signage, automotive, display, and general lighting applications, as well as the emergence of new applications such as wearable smart devices.
