Veeco Instruments Inc., Plainview, N.Y., announces that its GENxcel R&D Molecular Beam Epitaxy System earned the 2018 Compound Semiconductor (CS) Industry Innovation Award. Hosted by Compound Semiconductor magazine, the CS Industry Awards celebrate the success of companies across five unique categories. Specifically, the Innovation Award honors the most significant breakthrough in compound semiconductor manufacturing over the last 12 months.
The GENxcel R&D MBE system builds on the success of the GENxplor MBE system designed for compound semiconductor R&D and pilot production markets. The system produces high-quality epitaxial layers on substrates up to 100mm in diameter. The innovative architectural concept of GENxcel reduces the system footprint by 40 percent compared to similar 100mm wafer systems, improves the ease of maintenance, and allows users to easily integrate additional deposition and analysis chambers—specifically Veeco’s new atomic layer deposition (ALD) product line.
