Oxford Instruments Plasma Technology, England, announces that HLJ Technology Co. Ltd., Taiwan, has selected multiple Oxford Instruments Inductively Coupled Plasma (ICP) etch and Plasma Enhanced Chemical Vapor Deposition (PECVD) systems on cluster platforms for the production of six-inch VCSEL wafers. The Cobra ICP and PECVD process solutions are designed to support leading edge device fabrication such as VCSELs.
Recently, HLJ had built a mass production line for six-inch VCSEL wafers to enhance efficiency, and expedite greater control of production lead-times, capacity, and quality. The in-house line integrated epitaxial structure design, growth, wafer processes, and reliability tests. HLJ is committed to providing one-stop VCSEL devices shopping services for global users.
Dr Ian Barkshire, CEO of Oxford Instruments commented: “We are delighted that HLJ has chosen multiple Oxford Instruments systems for the production of high technology VCSEL devices. We continue to strengthen our position as a solution provider for compound semiconductors, including the VCSEL market. This partnership reinforces our commitment to enhance market-leading production capabilities “.
