Lasertec Corp., San Jose, Calif., introduces MAGICS series M8350/M8351, a new line of mask blank inspection systems that meet the requirement of next-generation semiconductor photomasks at the technology nodes of 14nm through 7nm.
Researchers from the University of California, Santa Barbara (UCSB), report that they have developed the highest-performing III-V metal-oxide semiconductor (MOS) field-effect transistors.
Semiconductor Equipment Manufacturing Industries (SEMI), San Jose, Calif., reports that after two years of decline, fab equipment spending for Front End facilities in 2014 is expected to increase by 24% in 2014 (US$35.7 billion).
Optotherm, Sewickley, Pa., has developed the EL troubleshooting system, which provides an alternative method of fault detection based on detection of infrared radiation.
Cadence Design Systems Inc., San Jose, Calif., and Intel Corp., Santa Clara, Calif., announce that they are collaborating to support Intel’s 14nm Tri-Gate process technology for customers of Intel Custom Foundry, which has developed an extensive design platform on Intel’s 22nm and 14nm Tri-gate process technology.
