KLA Tencor, Milpitas, Calif., released its new Voyager 1035 laser scanning patterned wafer inspector, an inline defect monitor for advanced logic and memory chip manufacturing that finds and flags critical defects inline.
For critical process monitoring applications, the Voyager 1035 employs a unique architecture, deep learning algorithms and several advanced technologies to produce industry-best laser scanning sensitivity at high throughput. This ensures fab engineers receive the timely, actionable defect data needed to take the corrective actions required to keep chip production on track.
The landmark attribute of Voyager 1035 is DefectWise deep learning technology that provides fast, inline separation of defects of interest from pattern noise and nuisance defects, resulting in increased sensitivity and improved capture rate of key defects. By producing accurate defect binning results, DefectWise reduces the time required for fab engineers to understand and correct process excursions.
It also has industry-unique oblique illumination and outside-the-lens design to reduce inspection noise, the largest total solid angle of collection in the industry that produces more signal to critical defects while also capturing signal from more defect types, and three segregated channels to enable data collection strategies that result in strong defect signal-to-noise.
Its new sensors have a 30% improvement in QE (quantum efficiency) for higher throughput and better sensitivity for lower dose inspection on delicate photoresists found in applications such as after develop inspection and photo cell monitoring in EUV lithography.
The new sensor technology works with a new pixel size, that increases resolution by >20% over the previous-generation Voyager for improved sensitivity and resolution to very small, yield-relevant defect types, resulting in a higher capture rate of tiny gap defects.
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KLA Tencor
